Teaching plan for the course unit

 

 

Close imatge de maquetació

 

Print

 

General information

 

Course unit name: Clean Room Processes, Nanomanufacturing and Nanoprocessing

Course unit code: 571414

Academic year: 2021-2022

Coordinator: Enric Bertran Serra

Department: Department of Electronic and Biomedical Engineering

Credits: 5

Single program: S

 

 

Estimated learning time

Total number of hours 125

 

Face-to-face and/or online activities

60

 

-  Lecture

Face-to-face

 

32

 

-  Special practices

Face-to-face

 

28

Supervised project

25

Independent learning

40

 

 

Competences to be gained during study

 

Basic competences

— Capacity to apply the acquired knowledge to problem-solving in new or relatively unknown environments within broader (or multidisciplinary) contexts related to the field of study.

— Capacity to integrate knowledge and tackle the complexity of formulating judgments based on incomplete or limited information, taking due consideration of the social and ethical responsibilities involved in applying knowledge and making judgments.

— Capacity to communicate conclusions, judgments and the grounds on which they have been reached to specialist and non-specialist audiences in a clear and unambiguous manner.


General competences

— Capacity to identify the scientific and industrial landscape in the immediate, national and international environment in the field of nanoscience and nanotechnology.

— Ability to take part in research and technological development projects.

— Initiative in the development of innovative work methods that can contribute to scientific and technological development in nanoscience and nanotechnology.


Specific competences

— Capacity to recognize technological advances and current problems in the domain of nanotechnology as an interdisciplinary science.

— Ability to perform technical tasks in the field of nanotechnology.

— Ability to design synthesis processes and processing steps for nanostructured materials.

— Ability to handle the basic tools of nanomanufacturing and nanomanipulation.

— Ability to perform research and development tasks in relation to new nanostructured materials and nanodevices with innovative functionalities and potential applications in biotechnology, pharmacotherapy, information processing and storage, and improved energy use.

 

 

 

 

Learning objectives

 

Referring to knowledge

The main goal of this course is to acquire the theoretical and practical knowledge of fabrication, deposition and etching techniques that can be used for the fabrication of structures and devices with micro and nanometre dimensions and in a cleanroom environment. This knowledge has to allow the student to give the advantages and disadvantages, limitations and fields of applications of each of the techniques and processes described.

 

— Become familiar with conventional lithographic techniques, their characteristics of resolution, their requirements and limitations, as well as the resists required for their use and their limitations.

 

— Become familiar with other lithographic techniques which are not conventional, their characteristics and actual limitations, as well as the materials on which they can be applied.

 

— Become familiar with deposition methods that can be used in nanoscience and nanotechnology.

 

— Become familiar with the etching processes useful in nanoscience and nanotechnology.

 

Referring to abilities, skills

— Evaluate the complementarity of the nanofabrication techniques presented with the aim of solving practical problems in nanoscience and nanotechnology.

 

— Evaluate the suitability of the different nanofabrication techniques described in technical and scientific studies.

 

— Define strategies for the use of nanofabrication and nanoprocessing techniques for the resolution of specific problems in nanoscience and nanotechnology.

 

— Find relevant scientific information from different scientific sources.

 

— Acquire a general vision and practical knowledge about the use of a cleanroom for the development of technological processes in micro and nanotechnology.

 

— Be able to use physical and chemical vapour deposition techniques for the fabrication of nanomaterials in a cleanroom environment.

 

— Be able to use photolithographic techniques for the definition of pattern and the further fabrication of micro and nanodevices.

 

— Be able to inspect the results of the fabrication process in the cleanroom.

 

— Understand the differences and complementarities between the techniques installed in the cleanroom and decide on their use to define the processes for the fabrication of a device.

 

 

Teaching blocks

 

1. Theory lectures

1.1. Introduction

1.2. Visible and ultraviolet optical lithography (OL)

1.3. Electron beam lithography (EBL)

1.4. Focused ion beam technology (FIB)

1.5. Non-conventional lithography

1.6. Deposition and growth techniques

1.7. Etching

1.8. Global fabrication processes

2. Practical lectures

2.1. Practical cleanroom sessions

2.2. Practical nanofabrication sessions

 

 

Teaching methods and general organization

 

— Ex-cathedra lectures

— Independent learning of theoretical contents

— Laboratory sessions

— Reading and critical discussion of scientific literature

— Teamwork

— Examination of the different teaching blocks

— Problem solving and practical situations

— Laboratory reports

En cas de mesures especials degut a la pandèmia COVID-19, les classes teòriques es realitzaran d’acord amb la normativa vigent de la Universitat de Barcelona. Per als experiments es realitzaran en grups amb proteccions adequades (màscara, pantalla facial, guants, ...), d’acord amb la normativa vigent de la Universitat de Barcelona.

 

 

Official assessment of learning outcomes

 

Continuous assessment

Assessment is based on exams/tests, class attendance, a report on the practical sessions and a final assignment. The final grade is calculated as follows: 55% of the grade corresponds to the theoretical part and 45% to the practical part.

The grade for the theoretical part (55%) is calculated as follows:

a) Two exams/tests on the 6 teaching blocks of the course: Optical lithography, Focused ion beam, Hot embossing and imprinting, Electron beam lithography, Deposition of materials and Processing of materials. Both exams are worth 60% of the grade for the theoretical part (each of the topics is worth 1/6 of this mark). To pass this part, students must obtain a grade of 5 or higher out of 10.

b) Exam/presentation (to be determined) on global fabrication, worth 15% of the grade for the theoretical part. To pass this part, students must obtain a grade of 5 or higher out of 10.

c) Oral presentation of an assignment, worth 25% of the grade for the theoretical part. It must be submitted in January 2018 (dates to be determined). Attendance to the presentations of the other students is mandatory. There is no minimum grade for this task to count for the final grade.

The grade for the practical part (45%) is calculated as follows:

a) Attendance to and written report on the cleanroom practical sessions, worth 85% of the grade for the practical part. To pass this part, students must obtain a grade of 5 or higher out of 10.

b) Attendance to and written report on the practical sessions on Hot embossing and imprinting, worth 15% of the grade for the practical part. There is no minimum grade for this task to count for the final grade.

To pass the course, students must obtain a final grade of 5 or higher out of 10, according to the percentages and particular conditions described above.

En cas de mesures especials degut a la pandèmia COVID-19, els exàmens es realitzaran d’acord amb la normativa vigent de la Universitat de Barcelona.


Repeat assessment

Students who do not pass the exams/tests in the theoretical part, the exam on global fabrication or the cleanroom practical sessions are eligible to repeat assessment of the tasks failed. In the case of the theoretical part, only tasks a) and b) can be retaken. The date for repeat assessment will be agreed with the students affected.

 

Examination-based assessment

Percentages for the theoretical and practical parts are the same as those for continuous assessment. Additionally, students who opt for single assessment must:

— Attend practical sessions, submit the corresponding reports and obtain a grade of 5 or higher out of 10.

— Present the assignment and obtain a grade of 5 or higher out of 10.

Assessment is based on an exam/test on the different teaching blocks and on global fabrication.

Percentages and conditions for each task are the same as those for continuous assessment.


Repeat assessment

Students who do not pass the exams/tests in the theoretical part, the exam on global fabrication or the cleanroom practical sessions are eligible to repeat assessment of the tasks failed. In the case of the theoretical part, only tasks a) and b) can be retaken. The date for repeat assessment will be agreed with the students affected.

 

 

Reading and study resources

Consulteu la disponibilitat a CERCABIB

Book

Cui, Zheng. Micro-nanofabrication : technologies and applications. Beijing : Higher Education Press ; [Berlin] : Springer, 2005  EnllaƧ

Encyclopedia of nanoscience and nanotechnology, Stevenson Ranch (Calif.) : American Scientific Publishers, 2004  EnllaƧ

Environmental monitoring for cleanrooms and controlled environments. New York [etc.] : Informa Healthcare, 2007 (Drugs and the pharmaceutical sciences ; 164)  EnllaƧ

Madou, Marc J. Fundamentals of microfabrication : the science of miniaturization. 2nd ed. Boca Ratón :CRC Press, 2002  EnllaƧ

Nanofabrication using focused ion and electron beams : principles and applications. Oxford : Oxford University, Press, 2012  EnllaƧ

Ohring, Milton. Materials science of thin films. 2nd ed. San Diego [etc.] : Academic Press, 2002  EnllaƧ

https://cercabib.ub.edu/discovery/search?vid=34CSUC_UB:VU1&search_scope=MyInst_and_CI&query=any,contains,b1164566*  EnllaƧ

Springer handbook of nanotechnology. 3rd ed. Berlin : Springer, 2010  EnllaƧ


Rescurs electrņnic  EnllaƧ

Venables, John. Introduction to surface and thin film processes. Cambridge : Cambridge University Press, 2000  EnllaƧ

William, W. Cleanroom technology: fundamentals of design, testing and operation. 2nd ed. ChichesterWiley, 2010  EnllaƧ

Journal

Cleanrooms, PennWell, USA  EnllaƧ

Cleanroom Technology, HPCi Media, UK  EnllaƧ

Controlled Environment. Vicon Publishing, Inc., USA  EnllaƧ

Web page

Cleanroom at Wikipedia  EnllaƧ

Cleanroom Training, NINN at PennState  EnllaƧ

ISO, International Standards 14644  EnllaƧ

Electronic text

Handbook of VLSI microlithography  : principles, tools, technology and applications. 2nd ed, .Park Ridge, N.J. : Noyes Publications ; Norwich, N.Y. : William Andrew Pub., 2001  EnllaƧ

LUWA: Comportament i Operativa en Sales Netes: Facultat de Físiques U.B. - 17/02/2009

Yujie Xiong, Brent Riggs, NRF Clean Room Manual at:  EnllaƧ